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Compact PECVD System with 3" Quartz Chamber up to 400°C - GSL

This is a miniature PECVD furnace with 3" diameter x 16" Length quartz chamber, internal heating coil, two-channel gas mixing & delivery system, and a vacuum pump. The complete system is Stainless steel flange on two ends of quartz tube, which allow vacuum up to 10^-2 torr by mechanical pump. The sample will be

Compact PECVD Slidable Tube Furnace with 2"OD Quartz tube and

OTF-1200X-50S-PE-SL is an affordable and compact PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system with a slideable mechanism. It consists of a 300W RF plasma generator, a 2"O.D split tube furnace and the integrated slidable rail which allows you preheat and slide the furnace to the sample

PECVD Split Single Zone Tube Furnace with 4 Channels Gas

OTF-1200X-4CLV-PE is a CE certified compact PE-CVD tube furnace system (Plasma enhanced chemical vapor deposition), which consists of 500W RF plasma source, 2" split tube furnace, 4 channels Power: 208-240VAC, 50/60Hz; Note: This RF power supply can accept 50 - 80 mm Max. quartz tube by changing flange.

Compact 4" CVD Furnace with Thermal Heater for Max. 3" Wafer

Furnace and Preheater. Compact CVD furnace system is modified from OTF-1200X-100 single zone tube furnace: 4.33" O.D x 4.05" I.D x 29.13" Length quartz tube; 1100ºC Max. working temperature; Water cooling flange on right-side is slidable for easy sample loading. Water cooling flange on left-side between the heater

Compact PECVD Tube Furnace - MTI KOREA - MTIKorea

Compact PECVD Tube Furnace with 2"OD Quartz tube and vacuum pump, Max.1200C, - OTF-1200X-50-PE-S-1 This system consists of: a 500W RF plasma generator, a 2" O.D split tube furnace with vacuum flange and fittings. and a double stage rotary vane pump with a movable working table. This system can be

1200°C Max. 4″ Tube Furnace with Sliding Flange for DIY CVD

4″ Tube Furnace with Sliding Flange for DIY CVD System – OTF-1200X-4-SF-UL. OTF-1200X-4-SF is a compact 4″ ID quartz tube furnace with slideable flange with 1200°C Max. working temperature, which is designed for customers to build a DIY CVD system easily. Categories: MTI Product, PECVD Coating Furnace.

PECVD Coating Furnace |

Compact 4″ CVD Furnace with Thermal Heater for Max. 3″ Wafer – OTF-1200X-4-NW-UL. Read More · Dual Quartz Tubes (5"/4") & Three Zones CVD Furnace upto

Compact 4″ CVD Furnace with Thermal Heater for Max. 3″ Wafer

Furnace and Preheater. Compact CVD furnace system is modified from OTF-1200X-100 single zone tube furnace : 4.33″ O.D x 4.05″ I.D x 29.13″ L quartz tube; 1100ºC Max. working temperature; Water cooling flange on right-side is slidable for easy sample loading. Water cooling flange on left-side between the heater

PECVD System Anti-Reflective Coating Passivation: c.PLASMA

centrotherm's fully automated PECVD system combines high throughput with excellent process security and reproduction capabilities. The tube systems ensure the creation of an extremely efficient and homogeneous anti-reflective coating using a direct plasma deposition process, which is limited in scope and comprises

‎[PDF]‎Thin Film Materials & their Deposition - nptel

one tenth the growth rate of wet oxidation) resulting in films that are compact, dense and nonporous. Heating coils. Heating coils. N2, O2, inlets. Gas outlets. Quartz tube Physical vapor deposition (PVD). ➢ Evaporation. ➢ High temperature. ➢ Sputtering. ➢ DC sputtering/ RF Sputtering. ➢ Chemical vapor deposition (CVD).

‎[PDF]‎Thin Film Materials & their Deposition - nptel

one tenth the growth rate of wet oxidation) resulting in films that are compact, dense and nonporous. Heating coils. Heating coils. N2, O2, inlets. Gas outlets. Quartz tube Physical vapor deposition (PVD). ➢ Evaporation. ➢ High temperature. ➢ Sputtering. ➢ DC sputtering/ RF Sputtering. ➢ Chemical vapor deposition (CVD).

Reduced Pressure Oxidation | SEMCO Technologies | Tools for high

SEMCO Technologies LYTOX features all the means for 24/7 full production in a compact, easy-to-maintain, safe and robust horizontal furnace platform. Reduced pressure horizontal thermal oxidation furnace; Up to 5 stacked quartz tube reaction chambers; No thermal interference between different tubes; Compliant with

PV Coating Vacuum Chamber Furnace - Vacuum Furnaces

High Temperature Vacuum Tube Furnace GSL-1100 Operational Manual. Introduction GSL-1100 series high temperature vacuum tube furnace is a compact designed for heating samples up to 1100 0C. Stainless steel vacuum flange with valve, vacuum gauge and quartz… read more

DEPOSITION SYSTEMS - Anasayfa

Mini CVD Tube Furnace OTF-1200X-S50-2F. Furnace Structure. Heavy duty steel casing. Energy efficient Al2O3 fibrous thermal insulation. Power Consumption. 1.75KW. Temperature. 1200 Max. for < 1hr 1100 for continuously heating. Heating rate <= 10C/min. Processing Tube. Quartz tube 50 x 43 x 450mm (O.D x I.D x

‎[PDF]‎Low-Temperature Deposition of Silicon-Nitride Layers by Using

Schematic of the PECVD system employed in the present work. vide good passivation, and the SiNx:H films can be used as AR coatings for mc-Si solar cells. II. EXPERIMENT. In the present work, SiNx deposition was performed using a horizontal PECVD reactor system consisting of a long horizontal quartz tube that was

1200°C 1 or 2 Zone PECVD Tube Furnace with Gas Mixer & Pump

VACUUM PUMP MOBILE CART ONLY AVAILABLE IF YOU PURCHASE A PUMP AND A DIGITAL VACUUM CONTROLLER. STF1200 series Chemical Vapor Deposition (CVD) and Plasma-Enhanced Chemical Vapor Deposition (PECVD) multi-zone split tube furnaces feature the famous Kanthal® (Sweden) wire heating